Instance Segmentation on UVO
Metric: ARmask (higher is better)
Metric: ARmask (higher is better)
| # | Model↕ | ARmask▼ | Extra Data | Paper | Date↕ | Code |
|---|---|---|---|---|---|---|
| 1 | GLEE-Pro | 72.6 | Yes | General Object Foundation Model for Images and V... | 2023-12-14 | Code |
| 2 | ODISE | 57.7 | Yes | Open-Vocabulary Panoptic Segmentation with Text-... | 2023-03-08 | Code |